1200C Max. Lab PECVD Furnace with Gas Delivery & Vacuum Pump
PECVD system is designed to decrease the reaction temperature of traditional CVD. It installed RF induction equipment in front of traditional CVD to ionize reacting gas, so the plasma is generated. Plasma’s high activity is Reaction is accelerated due to the high activity of plasma. So, this system is called PECVD.
This model is the newest product, it synthesized the advantages of most PECVD furnace systems, and added a pre-heating zone in the front of the PECVD furnace system. Tests showed that the deposition speed is quicker, the film quality is better, holes are less, and won’t crack. AISO fully automatic intelligent control system is independently designed by our company, it is more convenient to operate and its function is more powerful.
Wide application range of PECVD furnace: metal film, ceramic film, composite film, the continuous growth of various films. Easy to increase function, can expand plasma cleaning etch and other functions.
1. Heating System |
||
| Max.temperature | 1200℃ (1 hour) | |
| Working temperature | ≤1100℃ | |
| Chamber size | Φ100*1650mm (Tube diamater is customizable) | |
| Chamber material | High purity alumina fiber board | |
| Thermocouple | K type | |
| Temperatureaccuracy | ±1℃ | |
| PECVD furnaceTemperature control |
● 50 programmable segments for precise control of heating rate, cooling rate and dwell time. ● Built in PID Auto-Tune function with overheating & broken thermocouple broken protection. ● PLC automatic control system by PC controller inside. ● The temperature control system, sliding system (Time and Distance) could be controlled by program. |
|
| Heating length | 440mm | |
| Constant heating length | 200mm | |
| Heating element | Resistance wire | |
| Power supply | Single phase, 220V, 50Hz | |
| Rated power | 9kW | |
2. RF Plasma Source |
||
| RF frequency | 13.56 MHz±0.005% | |
| Output power | 500W | |
| Max reflect power | 500W | |
| RF output interface | 50 Ω, N-type, female | |
| Power stability | ±0.1% | |
| Harmonic component | ≤-50dbc | |
| Supply voltage/Frequency | Single phase AC220V 50/60HZ | |
| Whole efficiency | >=70% | |
| Power factor | >=90% | |
| Cooling method | Forced air | |
3. Three precision mass flowmeters control system of PECVD furnace |
||
| External dimension | 600x600x650mm | |
| Connector type | Swagelok SS joint | |
| Standard range (N2) | 0~100sccm, 0~200sccm, or customizable | |
| Accuracy | ±1.5% | |
| Linear | ±0.5～1.5% | |
| Repeatability | ±0.2% | |
| Response time | Gas property: 1～4 Sec; Electrical property: 10 Sec |
|
| Pressure range | 0.1～0.5 MPa | |
| Max.pressure | 3MPa | |
| Interface | Φ6,1/4” | |
| Display | 4 digit display | |
| Ambient temperature | 5~45 high purity gas | |
| Pressure gauge | －0.1～0.15 MPa, 0.01 MPa/unit | |
| Stop valve | Φ6 | |
| Polish SS tube | Φ6 | |
| Low vacuum system included | ||
